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Bashar Lahlouh

Личная информация

  • Страна местожительства: Jordan
  • Пол: Male
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Информация

Bashar Lahlouh

 

Dr. Bashar Lahlouh is a currently a faculty member at the physics department at the University of Jordan. 

University of Jordan
Department of Physics
Amman,11942 
Jordan

 Home Phone#:962-5-39950
 Mobile#: 962-78-5032541   
 Work# : 962-6-535500 ext:22043
 e-mail: bizlmi@yahoo.com
basher_lahlouh@ju.edu.jo

 

Education:   
1) BS in physics:    1991-1995          University of Jordan                          Amman, Jordan
2) MS in physics:    1999-2000            Texas Tech University                       Lubbock, Texas
.Worked on low-k during the MS period. The degree was awarded as a non-thesis degree after passing the qualifying exam and fulfillment of the degree’s requirements.
3) Ph.D in physics:   2000-2003           Texas Tech University                       Lubbock, Texas
Dissertation: PECVD deposition of low k materials. Depositing low k material and optimizing the CVD process to achieve controllable dielectric properties that can be tailored to current and future semiconductors industry needs. Deposition and characterization of nanoporous materials. Use of supercritical CO2 as an alternative method to introduce nanoporosity and cure plasma damaged nanoporous low-k materials.

 

Experience:
1) Research assistant:  1999-2003Texas Tech UniversityLubbock, Texas
 *Developed nanoporous low-k a-SiC/SiO/C:H films with dielectric constant as low as 2.1.
 *Developed effective treatment methods for dielectric constant recovery of plasma damaged nanoporous low-k organosilicate films.
 *Designed and constructed a supercritical carbon dioxide system for semiconductors applications.
 *Used supercritical carbon dioxide for selective extraction of CO2 soluble components to produce nanoporosity in organosilicate films.
 *Design and development of a  flow-through and pulsed supercritical carbon dioxide system. 
 *PECVD deposition of nanocrystalline SiC thin films.
*PECVD development and deposition of multiphase organosilicate films for nanoporous low-k application.
*Design and implementation of MEMS micropumps, micro channels, waveguides and micro– moisture sensors.

2) Teaching Assistant: 1999-2001                     Texas Tech University                  Lubbock, Texas
*Teaching first year general physics labs.
*Teaching assistant for Graduate Advanced Semiconductor Processing class.

3) Assistant Professor:     Applied Science Private University                  Amman, Jordan  
                                            March 2004 - September 2004 


4) Assistant Professor:     Jordan University                    Amman, Jordan  
                                             September 2004 until now  
 As an assistant professor, Dr. Lahlouh taught many graduate and undergraduate courses. The list of courses taught by Dr. Lahlouh includes: physics 101 (mechanics), physics 102 (electricity and magnetism), physics 103 (life sciences), physics 105 (medicine), modern physics, quantum mechanics, waves and optics, electronics, digital electronics, medical electronics, electricity and magnetism, and special topics (Spectroscopy). 
In 2007, Dr. Lahlouh started to build a material research lab. Currently, the lab is functional and Dr. Lahlouh’s graduate students are doing their graduate research in this lab. The lab includes the following instruments: spin coater, high temperature furnaces (1200oC), vacuum ovens (300o), thin-film metrology tool, Photoluminescence spectrometer (Uv-Vis),Atomic Force Microscope (AFM), polarizing microscope, and a hot-press.

Publications and Presentations:

1.“Low-k organosilicate films prepared by tetravinyltetramethylcyclotetrasiloxane,”
      J. Lubguban, T. Rajagopalan, N. Metha, B. Lahlouh,…
      J. Appl. Phys., 92 (2002),1033.

2.“Supercritical Carbon Dioxide Process for Forming Nanoporous Dielectrics,”
      S. Gangopadhyay, J. Lubguban, T. Rajagopalan, B.        Lahlouh, …
       International Sematech/ Ultra low k workshop 2002

3.    “Use of SCCO2 Processing for Integration and Formation of Ultra Low-k     Dielectrics,”
      D. Toma, M. Biberger, R. Butler, J. Sun, T. Rajagopalan, ,   B. Lahlouh,….  
International Sematech/ Ultra low k workshop 2002

4. “Novel Method for Producing Nanoporous Dielectric Films,”
      B. Lahlouh, X. Wang, N. Metha, S. Gangopadhyay,…
      MRS fall meeting 2000. (Symposium L)

5.“Supercritical CO2 Process for Porous Materials and Clean,” 
B. Lahlouh, S. Gangopadhyay,…. 
SRC Center for Advance Interconnect Systems Technologies Review Meeting, RPI 2002.

6. “Supercritical carbon dioxide extraction to produce low-k plasma enhanced chemical vapor deposited dielectric films,”J. A. Lubguban, J. Sun, T. Rajagopalan, B. Lahlouh,….  Appl. Phys. Letters, 81, 4407 (2002).

7.“Supercritical carbon dioxide extraction of porogens for the preparation of     ultralow-dielectric-constant films”
           Rajagopalan, T, Lahlouh, B, Lubguban, JA, et al.
           APPL PHYS LETT 82 (24): 4328-4330 JUN 16 2003


8.” A two-stage discrete peristaltic micropump”
            Berg, JM; Anderson, R; Anaya, M; Lahlouh, B; Holtz, M; Dallas, T
            SENSOR ACTUAT A-PHYS 104 (1): 6-10 MAR 15 2003

9. “Creating Nanoporosity By Selective Extraction Of Porogens Using Supercritical   Carbon Dioxide/Cosolvent Processes”
        B. Lahlouh, T. Rajagopalan, J. A. Lubguban etal.
        MRS spring Meeting 2003, April 22-24 2003, San Francisco, CA. 
10. “Silylation Using a Supercritical Carbon Dioxide Medium to Repair Plasma-Damaged Porous Organosilicate Films” 
B. Lahlouh, J. A. Lubguban, G. Sivaraman, R. Gale, and S. Gangopadhyay 
Electrochem. Solid-State Lett. 7, G338 (2004)

11. “Post treatment of plasma-enhanced chemical vapor deposited a-SiC:H films for    low-k dielectrics.” 
         B. Lahlouh, T. Rajagopalan, N. Biswas, J. Sun, D. Huang, S.L. Simon, J.A. Lubguban,    Shubhra Gangopadhyay. Thin Solid Films 497 (1-2): 109-114 feb 21 2006

12. “Ferrihydrite gels derived in the Fe(NO3)39H2O-C2H5OH-CH3CHCH2O ternary system”.    Talantsev, Evgueni F.; Pantoya, Michelle L.; Camagong, Cristina; Lahlouh, Bashar; Nicolich, Steven M.; Gangopadhyay, Shubhra.  Journal of Non-Crystalline Solids  (2005),  351(16&17),  1426-1432.  CODEN: JNCSBJ  ISSN:0022-3093.  CAN 143:155819  AN 2005:466955    CAPLUS

13. “Supercritical CO2 extraction of porogen phase: An alternative route to nanoporous dielectrics”.     Lubguban, J. A.; Gangopadhyay, S.; Lahlouh, B.; Rajagopalan, T.; Biswas, N.; Sun, J.; Huang, D. H.; Simon, S. L.; Mallikarjunan, A.; Kim, H.-C.; Hedstrom, J.; Volksen, W.; Miller, R. D.; Toney, M. F.  Journal of Materials Research  (2004),

 14. “Investigation on hexamethyldisilazane vapor treatment of plasma-damaged nanoporous organosilicate films”  
Applied Surface Science, 2006, vol. 252, no18, pp. 6323-6331 
           T. Rajagopalan, B. Lahlouh, J.A. Lubguban, N. Biswas, S. Gangopadhyay, J. Sun, D.H. Huang, S.L. Simon, D. Toma and R. Butler
15. “Hexamethyldisilazane vapor treatment of plasma damaged nanoporous
        methylsilsesquioxane films: Structural and electrical characteristics”
         Thin Solid Films 516 (2008) 3399–3404
         T. Rajagopalan , B. Lahlouh , I. Chari a, M.T. Othman ,N. Biswas , D. Toma , S. Gangopadhyay

  
16. “Ellipsometric characterization of PbI2 thin film on glass”
           Physica B 404 (2009) 1–6
           A. Ahmad, S. Saq'an, B. Lahlouh, M. Hassan, A. Alsaad and H. El-Nasser

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